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FIZIKA B 4 (1995) 1, 53-57
 
LETTER TO THE EDITOR
CR-39(DOP) AS A RELATIVISTIC 238U-ION DETECTOR
DEBA P. BHATTACHARYYA, RUMA RAKSHIT and PRATIBHA PAL
Department of Theoretical Physics,
Indian Association for the Cultivation of Science,
Jadavpur, Calcutta 700 032, India
Received 1 September 1994
Revised manuscript received 14 November 1994
CR-39(DOP) stack was exposed to 927 MeV/n 23892U beam from
the Lawrence Berkeley Laboratory (LBL) accelerator BEVALAC at an angle of 30o
to the detector surface. The chemically processed sheets were investigated using a Leitz
Ortholux optical microscope. 644 etch pit cone lengths were measured and the track etch
rate has been found to be (174 �11) mm/h.
The present result is in accord with the data of Heyna et al. The estimated charge
sensitivity has been found to follow the extrapolated results of Salamon et al. The
present survey on the etch rate ratio has been found to increase faster than exponentially
with Z/b and follows the relation VT/VG=exp[A
+ B(Z/b-60) + C(Z/b-60)2]
where A=1.623�0.064, B=-0.0444�0.0015
and C=0.000506�0.000064 for 27.6�
Z/b �106.4.
UDC 539.17
PACS 25.75.+r
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